Sputtering and amorphization of crystalline semiconductors by Nanodroplet Bombardment

Grustan Gutierrez, E. , Wei, C., Wang, B. and Lanza, M. (2017) Sputtering and amorphization of crystalline semiconductors by Nanodroplet Bombardment. Crystal Research and Technology, 52(1), 1600240. (doi: 10.1002/crat.201600240)

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In this review we expose how Nanodroplet Bombardment of surfaces by charged particles produced through electrospray atomization offers unparalleled opportunities for surface engineering of chemically inert crystalline materials. The sputtering yields and rates are comparable or higher than reactive etching techniques and significantly higher than other physical sputtering systems. Moreover, bombardment can amorphatize a thin layer of the target. The imposed physical characteristics of the electrospray, droplet diameter, molecular mass of the spray, and kinetic energy will determine the sputtering and amorphization efficiency, and the topography of the processed target. Molecular dynamics studies have clarified the mechanisms of both processes; amorphous layers appear due to ultra‐fast quenching of melted target pools around the impact area while sputtering is driven by a combination of collision cascades, thermal evaporation, and, for large and fast projectiles, of hydrodynamic forces.

Item Type:Articles
Additional Information:This work has been supported by the Young 1000 Global Talent Recruitment Program of the Ministry of Education of China, the National Natural Science Foundation of China (grants no. 61502326, 41550110223, 11661131002), the Government of Jiangsu Province (grant no. BK20150343), the Ministry of Finance of China (grant no. SX21400213) and the Young 973 National Program of the Chinese Ministry of Science and Technology (grant no. 2015CB932700).
Glasgow Author(s) Enlighten ID:Grustan Gutierrez, Dr Enric
Authors: Grustan Gutierrez, E., Wei, C., Wang, B., and Lanza, M.
College/School:College of Science and Engineering > School of Engineering > Autonomous Systems and Connectivity
Journal Name:Crystal Research and Technology
ISSN (Online):1521-4079
Published Online:10 January 2017

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