Propagation of amorphous oxide nanowires via the VLS mechanism: growth kinetics

Shakthivel, D., Navaraj, W. T., Champet, S., Gregory, D. H. and Dahiya, R. S. (2019) Propagation of amorphous oxide nanowires via the VLS mechanism: growth kinetics. Nanoscale Advances, (doi:10.1039/C9NA00134D) (Early Online Publication)

Shakthivel, D., Navaraj, W. T., Champet, S., Gregory, D. H. and Dahiya, R. S. (2019) Propagation of amorphous oxide nanowires via the VLS mechanism: growth kinetics. Nanoscale Advances, (doi:10.1039/C9NA00134D) (Early Online Publication)

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Abstract

This work reports the growth kinetics of amorphous nanowires (NWs) developed by Vapour-liquid-solid (VLS) mechanism. The model presented here incorporates all atomistic processes contributing to the growth of amorphous oxide NWs having diameters in 5-100 nm range. The steady state growth condition has been described by balancing the key atomistic process steps. It is found that the 2D nano-catalyst liquid and NWs solid (L-S) interface play central role in the kinetic analysis. The balance between 2D Si layer crystallization and oxidation rate is quantitatively examined and compared with experimental values. The atomistic process dependencies of NWs growth rate, supersaturation (C/C0), desolvation energy (QD) barrier and NWs diameter etc. have been analyzed in detail. The model successfully predicts the reported NWs growth rate in range of 1-10 µm/s. A novel seed/catalyst metal-based synthesis strategy for the preparation of amorphous silica NWs is reported. Nickel thin film over Si is used as a seed metal for the Au assisted VLS growth of silica NWs. The experimental results provide evidence that the creation of SiO under given conditions and followed by Si injection in the Au-Si nano-catalyst solution. The usage of seed metal was observed to reduce the growth temperature compared to the methods reported in literature and obtain similar growth rates. The technique presented here holds promise for the synthesis of sub-100 nm diameter NWs.

Item Type:Articles
Status:Early Online Publication
Refereed:Yes
Glasgow Author(s) Enlighten ID:Dahiya, Professor Ravinder and Shakthivel, Dr Dhayalan and Gregory, Professor Duncan and CHAMPET, Simon and Navaraj, Mr William
Authors: Shakthivel, D., Navaraj, W. T., Champet, S., Gregory, D. H., and Dahiya, R. S.
College/School:College of Science and Engineering > School of Chemistry
College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Nanoscale Advances
Publisher:Royal Society of Chemistry
ISSN:2516-0230
ISSN (Online):2516-0230
Published Online:17 July 2019
Copyright Holders:Copyright © 2019 The Royal Society of Chemistry
First Published:First published in Nanoscale Advances 2019
Publisher Policy:Reproduced under a Creative Commons License

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Project CodeAward NoProject NamePrincipal InvestigatorFunder's NameFunder RefLead Dept
663861Engineering Fellowships for Growth: Printed Tactile SKINRavinder DahiyaEngineering and Physical Sciences Research Council (EPSRC)EP/M002527/1ENG - ENGINEERING ELECTRONICS & NANO ENG
3017280Engineering Fellowships for Growth: Printed Tactile SKINRavinder DahiyaEngineering and Physical Sciences Research Council (EPSRC)EP/R029644/1ENG - Electronics & Nanoscale Engineering