Photochemical generation of light responsive surfaces

Blasco, E., Piñol, M., Oriol, L., Schmidt, B. V.K.J. , Welle, A., Trouillet, V., Bruns, M. and Barner-Kowollik, C. (2013) Photochemical generation of light responsive surfaces. Advanced Functional Materials, 23(32), pp. 4011-4019. (doi:10.1002/adfm.201203602)

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Abstract

The preparation of patterned photoswitchable surfaces by employing the nitrile imine‐mediated tetrazole ene cycloaddition (NITEC) photoinduced reaction in the presence of dipolarophiles based on photoresponsive azobenzene moieties is reported. The dipolarophile used is a maleimide carrying either an azobenzene unit or a first generation dendron containing two azobenzene units. X‐ray photoelectron spectroscopy (XPS) is employed to analyze the functionalized silicon wafers, while time‐of‐flight secondary ion mass spectrometry (ToF‐SIMS) evidences the spatial control of the functionalization of the surface achieved by using a micropatterned shadow mask. Water contact angle measurements and optical inspection observing the behavior of a water droplet demonstrate the photoinduced change on wettability of the structured functionalized surfaces due to the reversible trans‐to‐cis isomerization of the azobenzene moities.

Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Schmidt, Dr Bernhard
Authors: Blasco, E., Piñol, M., Oriol, L., Schmidt, B. V.K.J., Welle, A., Trouillet, V., Bruns, M., and Barner-Kowollik, C.
College/School:College of Science and Engineering > School of Chemistry
Journal Name:Advanced Functional Materials
Publisher:Wiley
ISSN:1616-301X
ISSN (Online):1616-3028
Published Online:12 March 2013

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