Magnetoresistance between oxidized Co-rich particles grown by high current electrochemical deposition

Plaza, M., Perez, L., Sanchez, M.C., Fernandez-Pacheco, A. and De Teresa, J.M. (2009) Magnetoresistance between oxidized Co-rich particles grown by high current electrochemical deposition. Solid State Communications, 149, pp. 45-46. (doi: 10.1016/j.ssc.2009.08.024)

Abstract

In this work, we present Co-rich particles which have been successfully grown by high current electroplating. This technique produces particles with a Co–Cu core surrounded by an oxidized shell. This shell has two consequences: on the one hand, it electrically isolates the magnetic core and acts as a tunnel barrier; on the other hand, the ferromagnetic/antiferromagnetic structure causes an exchange bias coupling when cooling the particles in the presence of magnetic field. We also present magnetoresistance measurements up to 9 T. At low field, direct tunnelling between magnetic cores through the insulating layer properly explains the experimental observations, but, at high field, a linear contribution dominates the MR. The latter behaviour can be understood by assuming second-order tunnelling.

• Item Type: Articles
• Status: Published
• Refereed: Yes
• Glasgow Author(s) Enlighten ID: Fernandez-Pacheco, Dr Amalio
• Authors: Plaza, M., Perez, L., Sanchez, M.C., Fernandez-Pacheco, A., and De Teresa, J.M.
• College/School: College of Science and Engineering > School of Physics and Astronomy
• Journal Name: Solid State Communications
• Publisher: Elsevier
• ISSN: 0038-1098
• Published Online: 21 August 2009