Direct patterning of cobalt nanostructures using focused electron beam-induced deposition

Fernández-Pacheco, A. , Córdoba, R., Serrano-Ramón, L.E., Ibarra, M.R. and De Teresa, J.M. (2013) Direct patterning of cobalt nanostructures using focused electron beam-induced deposition. In: Kobayashi, Y. and Suzuki, H. (eds.) Cobalt: Occurrence, Uses and Properties. Nova Publishers: New York, pp. 255-272. ISBN 9781628082784

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The fabrication of ferromagnetic nanostructures is one of the key factors for theimmense development of emerging fields such as spintronics, nanomagnetism orbiomagnetism. In order to fabricate cobalt nanostructures, standard techniques such asevaporation or sputtering, together with optical or electron beam lithography, arenormally used.During the last years, we have investigated a different route, using focused electronbeam-induced-deposition (FEBID) and Co2(CO)8 as gas precursor. FEBID is anadvanced "direct writing" nanolithography technique, consisting on the local chemicalvapor deposition of a gas adsorbed on a substrate, induced by the interaction of the gasmolecules with a focused beam of electrons in the keV-range.In this chapter, we summarize some of the work performed in our group regardingthe growth of Co nanostructures using FEBID. We show the strong influence the beam current has on composition, microstructure, shape and magnetic properties of Co FEBIDdeposits. Also, some examples of the huge potential of FEBID to fabricate functional twoand three-dimensional nanostructures are presented.

Item Type:Book Sections
Glasgow Author(s) Enlighten ID:Fernandez-Pacheco, Dr Amalio
Authors: Fernández-Pacheco, A., Córdoba, R., Serrano-Ramón, L.E., Ibarra, M.R., and De Teresa, J.M.
College/School:College of Science and Engineering > School of Physics and Astronomy
Publisher:Nova Publishers

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