Mansell, R., Petit, D.C.M.C., Fernandez-Pacheco, A. , Lavrijsen, R., Lee, J.H. and Cowburn, R.P. (2014) Magnetic properties and interlayer coupling of epitaxial Co/Cu films on Si. Journal of Applied Physics, 116, 063906. (doi: 10.1063/1.4893306)
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Abstract
Thin films of Co and Co/Cu/Co trilayers with wedged Cu interlayers were grown epitaxially on Cu buffer layers on hydrogen passivated Si(001) wafers. We find that single Co layers have a well-defined four-fold anisotropy but with smaller in-plane anisotropies than observed in Co grown on Cu crystals. Ruderman–Kittel–Kasuya–Yosida (RKKY) interlayer coupling is observed in one Co/Cu/Co sample which is the smoothest of the films as measured by atomic force microscopy. Some of the films also form a dot-like structure on the surface. Intermixing at elevated temperatures between the Cu buffer and Si limits the ability to form flat surfaces to promote RKKY coupling.
Item Type: | Articles |
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Status: | Published |
Refereed: | Yes |
Glasgow Author(s) Enlighten ID: | Fernandez-Pacheco, Dr Amalio |
Authors: | Mansell, R., Petit, D.C.M.C., Fernandez-Pacheco, A., Lavrijsen, R., Lee, J.H., and Cowburn, R.P. |
College/School: | College of Science and Engineering > School of Physics and Astronomy |
Journal Name: | Journal of Applied Physics |
Publisher: | American Institute of Physics |
ISSN: | 0021-8979 |
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