Frigerio, J. et al. (2015) Heavily phosphorous-doped Germanium thin films for mid-infrared plasmonics. 2015 IEEE 12th International Conference on Group IV Photonics (GFP), Vancouver, Canada, 26-28 Aug 2015. pp. 94-95. ISBN 9781479982554 (doi: 10.1109/Group4.2015.7305964)
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Abstract
Heavily doped Ge thin films grown on different substrates have been investigated by infrared (IR) reflectometry. Screened plasma frequency and losses have been determined to assess the possibilities and limitations of Ge for mid infrared plasmonic.
| Item Type: | Conference or Workshop Item |
|---|---|
| Additional Information: | The research leading to these results has received funding from the European Union's Seventh Framework Programme under grant agreement n°613055. |
| Keywords: | Plasmons;Reflectivity;Reflectometry;Substrates |
| Status: | Published |
| Refereed: | Yes |
| Glasgow Author(s) Enlighten ID: | Samarelli, Mr Antonio and Paul, Professor Douglas and Gallacher, Dr Kevin |
| Authors: | Frigerio, J., Baldassarre, L., Sakat, E., Samarelli, A., Gallacher, K., Fischer, M., Brida, D., Paul, D., Isella, G., Biagioni, P., and Ortolani, M. |
| College/School: | College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering |
| Research Group: | Semiconductor Devices |
| ISSN: | 1949-2081 |
| ISBN: | 9781479982554 |
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