Suppression of bandgap shifts in GaAs/AlGaAs multiquantum wells using hydrogen plasma processing

Hamilton, C.J., Hicks, S.E., Vögele, B., Marsh, J.H. and Aitchison, J.S. (1995) Suppression of bandgap shifts in GaAs/AlGaAs multiquantum wells using hydrogen plasma processing. Electronics Letters, 31(16), pp. 1393-1394. (doi: 10.1049/el:19950911)

Full text not currently available from Enlighten.

Abstract

A new method of suppressing the intermixing of GaAs/AlGaAs multiple quantum wells is outlined. The technique involves modifying the native surface oxide of gallium arsenide in a hydrogen plasma to form Ga/sub 2/O/sub 3/. The technique is impurity free, reproducible and area selective.

Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Marsh, Professor John
Authors: Hamilton, C.J., Hicks, S.E., Vögele, B., Marsh, J.H., and Aitchison, J.S.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Electronics Letters
Publisher:Institution of Engineering & Technology
ISSN:0013-5194
ISSN (Online):1350-911X

University Staff: Request a correction | Enlighten Editors: Update this record