Qiu, B.C. et al. (2000) Fabrication of 2 x 2 crosspoint switches using a sputtered SiO2 intermixing technique. IEEE Photonics Technology Letters, 12(3), pp. 287-289. (doi: 10.1109/68.826916)
Full text not currently available from Enlighten.
Abstract
We report the fabrication of a 2×2 crosspoint switch, which monolithically integrates passive waveguides and electroabsorption modulators on one chip, using the sputtered SiO 2 technique for quantum-well intermixing. The static performance of the modulators has been tested, and a modulation depth of 25 dB has been obtained at a wavelength of 1.55 μm for an applied bias of 2 V.
Item Type: | Articles |
---|---|
Status: | Published |
Refereed: | Yes |
Glasgow Author(s) Enlighten ID: | Marsh, Professor John and De La Rue, Professor Richard |
Authors: | Qiu, B.C., Qian, Y.H., Kowalski, O.P., Bryce, A.C., Aitchison, J.S., De La Rue, R.M., Marsh, J.H., Owen, M., White, I.H., Penty, R.V., Franzen, A., Hunter, D.K., and Andonovic, I. |
College/School: | College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering |
Journal Name: | IEEE Photonics Technology Letters |
Publisher: | IEEE |
ISSN: | 1041-1135 |
ISSN (Online): | 1941-0174 |
University Staff: Request a correction | Enlighten Editors: Update this record