A Process Development on Inductively Coupled Plasma Reactive Ion Etching in Cl2/BCl3 Chemistry for Fabricating GaN-based Vertical Nanowires

Li, X. , Fu, Y.-C. and Thayne, I.G. (2017) A Process Development on Inductively Coupled Plasma Reactive Ion Etching in Cl2/BCl3 Chemistry for Fabricating GaN-based Vertical Nanowires. 43rd International Conference on Micro and Nanoengineering (MNE 2017), Braga, Portugal, 18-22 Sept 2017.

Full text not currently available from Enlighten.

Abstract

No abstract available.

Item Type:Conference or Workshop Item
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Fu, Mr Yen-Chun and Li, Dr Xu and Thayne, Professor Iain
Authors: Li, X., Fu, Y.-C., and Thayne, I.G.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Related URLs:

University Staff: Request a correction | Enlighten Editors: Update this record