Etching Process for Producing Various Sloping Sidewall of III-V Antimonide-based Materials for LED/PD Applications

Li, X. , Reza, M., Steer, M., Gaetano, E.D., Sorel, M., Thayne, I.G., Lusk, D. and MacGregor, C. (2018) Etching Process for Producing Various Sloping Sidewall of III-V Antimonide-based Materials for LED/PD Applications. 62nd International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), Puerto Rico, 29 May - 1 June 2018.

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Abstract

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Item Type:Conference or Workshop Item
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Steer, Dr Matthew and Li, Dr Xu and Thayne, Professor Iain and Sorel, Professor Marc and Reza, Mr Manuel
Authors: Li, X., Reza, M., Steer, M., Gaetano, E.D., Sorel, M., Thayne, I.G., Lusk, D., and MacGregor, C.
College/School:College of Science and Engineering
College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
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