Confinement-induced InAs/GaSb heterojunction electron–hole bilayer tunneling field-effect transistor

Padilla, J. L., Medina-Bailon, C., Alper, C., Gamiz, F. and Ionescu, A. M. (2018) Confinement-induced InAs/GaSb heterojunction electron–hole bilayer tunneling field-effect transistor. Applied Physics Letters, 112(18), 182101. (doi: 10.1063/1.5012948)

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Abstract

Electron–Hole Bilayer Tunneling Field-Effect Transistors are typically based on band-to-band tunneling processes between two layers of opposite charge carriers where tunneling directions and gate-induced electric fields are mostly aligned (so-called line tunneling). However, the presence of intense electric fields associated with the band bending required to trigger interband tunneling, along with strong confinement effects, has made these types of devices to be regarded as theoretically appealing but technologically impracticable. In this work, we propose an InAs/GaSb heterostructure configuration that, although challenging in terms of process flow design and fabrication, could be envisaged for alleviating the electric fields inside the channel, whereas, at the same time, making quantum confinement become the mechanism that closes the broken gap allowing the device to switch between OFF and ON states. The utilization of induced doping prevents the harmful effect of band tails on the device performance. Simulation results lead to extremely steep slope characteristics endorsing its potential interest for ultralow power applications.

Item Type:Articles
Additional Information:This research received funding from the European Community’s Seventh Framework Programme Marie Curie Action under grant agreement No. 291780 (Andalucia Talent Hub) and from the Spanish Ministry of Economy (TEC2014- 59730-R).
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Medina Bailon, Miss Cristina
Authors: Padilla, J. L., Medina-Bailon, C., Alper, C., Gamiz, F., and Ionescu, A. M.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Applied Physics Letters
Publisher:AIP Publishing
ISSN:0003-6951
ISSN (Online):1077-3118
Copyright Holders:Copyright © 2018 AIP Publishing
First Published:First published in Applied Physics Letters 112(18): 182101
Publisher Policy:Reproduced in accordance with the publisher copyright policy

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