Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 and HfO2 Films Investigated by Using in situ Auger Electron Spectroscopy

Zhou, H., Fu, Y.-C., Mirza, M. M.A. and Li, X. (2018) Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 and HfO2 Films Investigated by Using in situ Auger Electron Spectroscopy. AVS 18th International Conference on Atomic Layer Deposition (ALD) Featuring the 5th International Atomic Layer Etching Workshop (ALE), Incheon, Korea, 29 Jul - 01 Aug 2018.

Full text not currently available from Enlighten.

Publisher's URL: https://ald2018.avs.org/

Abstract

No abstract available.

Item Type:Conference or Workshop Item
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Fu, Mr Yen-Chun and Li, Dr Xu and Mirza, Dr Muhammad M A and Zhou, Dr Haiping
Authors: Zhou, H., Fu, Y.-C., Mirza, M. M.A., and Li, X.
Subjects:Q Science > QC Physics
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Research Group:AVS

University Staff: Request a correction | Enlighten Editors: Update this record