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Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 and HfO2 Films Investigated by Using in situ Auger Electron Spectroscopy

Zhou, H., Fu, Y.-C., Mirza, M. M.A. and Li, X. (2018) Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 and HfO2 Films Investigated by Using in situ Auger Electron Spectroscopy. AVS 18th International Conference on Atomic Layer Deposition (ALD) Featuring the 5th International Atomic Layer Etching Workshop (ALE), Incheon, Korea, 29 Jul - 01 Aug 2018.

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Publisher's URL: https://ald2018.avs.org/

Abstract

No abstract available.

Item Type:Conference or Workshop Item
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Mirza, Dr Muhammad M A and Zhou, Dr Haiping and Fu, Mr Yen-Chun and Li, Dr Xu
Authors: Zhou, H., Fu, Y.-C., Mirza, M. M.A., and Li, X.
Subjects:Q Science > QC Physics
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Research Group:AVS

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