Lee, C.K., Placido, F., Cochran, S. and Kirk, K.J. (2002) Growth of Sputtered AlN Thin Film on Glass in Room Temperature. In: 2002 IEEE International Ultrasonics Symposium, Munich, Germany, 08-11 Oct 2002, pp. 1119-1122. ISBN 9780780375826 (doi: 10.1109/ULTSYM.2002.1192490)
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Abstract
Highly [002] oriented AlN thin film is deposited on glass substrate by RF magnetron sputtering method. The X-ray diffraction shows that the AlN thin film has grown in a preferred [002] orientation but other orientation starts to build up as the thickness increases. The surface morphology of the c-axis texture of the AlN thin film is obtained by scanning electron microscopy. The d/sub 33/ coefficient of the AlN thin film is measured using piezoresponse microscopy and the result obtained is 3.8pm/V.
| Item Type: | Conference Proceedings |
|---|---|
| Status: | Published |
| Refereed: | Yes |
| Glasgow Author(s) Enlighten ID: | Cochran, Professor Sandy |
| Authors: | Lee, C.K., Placido, F., Cochran, S., and Kirk, K.J. |
| College/School: | College of Science and Engineering > School of Engineering > Systems Power and Energy |
| ISSN: | 1051-0117 |
| ISBN: | 9780780375826 |
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