Low-Tc Josephson junctions with tailored barrier

Weides, M. , Schindler, C. and Kohlstedt, H. (2007) Low-Tc Josephson junctions with tailored barrier. Journal of Applied Physics, 101(6), 063902. (doi:10.1063/1.2655487)

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Abstract

Nb∕Al2O3∕Ni0.6Cu0.4∕NbNb∕Al2O3∕Ni0.6Cu0.4∕Nb based superconductor-insulator-ferromagnet-superconductor Josephson tunnel junctions with a thickness step in the metallic ferromagnetic Ni0.6Cu0.4Ni0.6Cu0.4 interlayer were fabricated. The step was defined by optical lithography and controlled etching. The step height is on the scale of a few angstroms. Experimentally determined junction parameters by current-voltage characteristics and Fraunhofer pattern indicate uniform ferromagnetic layer thicknesses and the same interface transparencies for etched and nonetched F layers. This technique could be used to tailor low-Tclow-Tc Josephson junctions having controlled critical current densities at defined parts of the junction area, as needed for tunable resonators, magnetic-field driven electronics, or phase modulated devices.

Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Weides, Professor Martin
Authors: Weides, M., Schindler, C., and Kohlstedt, H.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Journal of Applied Physics
Publisher:American Institute of Physics
ISSN:0021-8979
ISSN (Online):1089-7550
Published Online:20 March 2007

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