Al-Ameri, T. (2017) Statistical Variability in 5 nm Vertically Stacked Lateral Si Nanowire Transistors. 12th IEEE Nanotechnology Materials and Devices Conference (NMDC 2017), Singapore, 2-4 Oct 2017.
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149994.pdf - Accepted Version 591kB |
Abstract
In this work, we present a comprehensive computational study of the impact of the principle sources of statistical variability, i.e., random dopant fluctuations, wire edge roughness, and metal gate granularity, on the threshold voltage, drain-induced barrier lowering, and drive current. Furthermore, we investigated the position dependent performance and geometrical variation of the lateral nanowires in the stack as new sources of process variability.
Item Type: | Conference or Workshop Item |
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Status: | Published |
Refereed: | Yes |
Glasgow Author(s) Enlighten ID: | Al-Ameri, Talib Mahmood Ali |
Authors: | Al-Ameri, T. |
College/School: | College of Science and Engineering > School of Engineering |
Copyright Holders: | Copyright © 2017 IEEE |
Publisher Policy: | Reproduced in accordance with the copyright policy of the publisher |
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