A 3-D atomistic study of archetypal double gate MOSFET structures

Brown, A.R., Watling, J.R. and Asenov, A. (2002) A 3-D atomistic study of archetypal double gate MOSFET structures. Journal of Computational Electronics, 1(1-2), pp. 165-169. (doi: 10.1023/A:1020704919992)

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The double gate MOSFET architecture has been proposed as a possible solution to allow the scaling of MOSFETs to the sub-30 nm regime, particularly due to its inherent resistance to short-channel effects. The use of lightly doped, or even undoped, channels means that such devices should be inherently resistant to random dopant induced fluctuations which will be one of the major obstacles to MOSFET scaling towards the end of the Si Roadmap. Random dopants within the channel are not, however, the only source of intrinsic fluctuations within MOSFETs at this scale. In this paper we investigate the impact of discrete dopants in the source and drain, individual charges within the active region and line edge roughness on the intrinsic parameter fluctuations in double gate MOSFETs.

Item Type:Articles
Glasgow Author(s) Enlighten ID:Brown, Mr Andrew and Watling, Dr Jeremy and Asenov, Professor Asen
Authors: Brown, A.R., Watling, J.R., and Asenov, A.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Journal of Computational Electronics
ISSN (Online):1572-8137
Published Online:02 November 2004

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