Simulation study of high performance III-V MOSFETs for digital applications

Kalna, K., Yang, L. and Asenov, A. (2003) Simulation study of high performance III-V MOSFETs for digital applications. Journal of Computational Electronics, 2(2-4), pp. 341-345. (doi: 10.1023/B:JCEL.0000011449.09021.55)

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Abstract

We have studied the performance potential of an 80 nm physical gate length MOSFET with GaAs channel and high-k gate insulator using ensemble Monte Carlo simulations. The results show that a such device could deliver a 100–125% increase in the drive current compared to conventional MOSFETs with analogous channel lengths and device structure. This improvement is much higher than the 20–30% drive current increase in similar devices with strained Si channels on virtual SiGe substrates.

Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Asenov, Professor Asen and Kalna, Dr Karol
Authors: Kalna, K., Yang, L., and Asenov, A.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Journal of Computational Electronics
ISSN:1569-8025
ISSN (Online):1572-8137
Published Online:02 November 2004

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