Nanofabrication of electrode arrays by electron-beam and nanoimprint lithographies

Sandison, M. E. and Cooper, J. M. (2006) Nanofabrication of electrode arrays by electron-beam and nanoimprint lithographies. Lab on a Chip, 6(8), pp. 1020-1025. (doi:10.1039/b516598a)

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Abstract

The fabrication of ordered nanoelectrode arrays using both electron-beam lithography and nanoimprint lithography is described. Arrays of nanoelectrodes with varying individual electrode diameters were produced and characterised electrochemically. Whilst both methods are highly reproducibile, nanoimprint lithography has the potential to produce devices rapidly and at low-cost. To our knowledge, this is the first report where nanoimprint lithography is employed for the production of nanoelectrode arrays for electroanalytical sensors.

Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Cooper, Professor Jonathan
Authors: Sandison, M. E., and Cooper, J. M.
College/School:College of Science and Engineering > School of Engineering > Biomedical Engineering
College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Lab on a Chip
Publisher:Royal Society of Chemistry
ISSN:1473-0197
ISSN (Online):1473-0189
Published Online:21 June 2006

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