Tilt-corrected stitching for electron beam lithography

Thoms, S. and Macintyre, D. (2007) Tilt-corrected stitching for electron beam lithography. Microelectronic Engineering, 84, pp. 793-796. (doi:10.1016/j.mee.2007.01.127)

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Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Thoms, Dr Stephen and Macintyre, Dr Douglas
Authors: Thoms, S., and Macintyre, D.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Microelectronic Engineering

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