Towards nano-fluidics by solvent deformation of electron beam resist

Pearson, J.L. and Cumming, D.R.S. (2005) Towards nano-fluidics by solvent deformation of electron beam resist. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 23(6), pp. 2793-2797. (doi:10.1116/1.2131876)

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Publisher's URL: http://dx.doi.org/10.1116/1.2131876

Abstract

Improvements in the fabrication technology of planar micro- and nano-fluidic systems are continually being sought. In this work, we demonstrate and characterize a potential method for making planar nano-fluidic channels in cross-linked UV-3 resist using a single-step electron-beam lithography process. Earlier work indicated that the fluids used in the resist development process influenced the final form of the nano-fluidic structures. In this study the development, rinsing and drying conditions for the resist processing have been investigated in detail to find the best conditions for channel formation. The process was then exploited to construct more complex planar nano-fluidic features, including Y- and T-shaped junctions that are required for practical systems.

Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Cumming, Professor David
Authors: Pearson, J.L., and Cumming, D.R.S.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Publisher:American Institute of Physics
ISSN:1071-1023
ISSN (Online):1520-8567

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Project CodeAward NoProject NamePrincipal InvestigatorFunder's NameFunder RefLead Dept
292521Scalable nanotechnology for integrated sensor arraysDavid CummingEngineering & Physical Sciences Research Council (EPSRC)GR/A10987/01ENG - ENGINEERING ELECTRONICS & NANO ENG