A non-destructive method for the removal of residual resist in imprinted patterns

Chen, Y., Macintyre, D. and Thoms, S. (2003) A non-destructive method for the removal of residual resist in imprinted patterns. Microelectronic Engineering, 67-8, pp. 245-251. (doi:10.1016/S0167-9317(03)00184-9)

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Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Thoms, Dr Stephen and Macintyre, Dr Douglas
Authors: Chen, Y., Macintyre, D., and Thoms, S.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Microelectronic Engineering

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