New organic photo-curable nanoimprint resist ≪mr-NIL210≫ for high volume fabrication applying soft PDMS-based stamps

Messerschmidt, M., Greer, A., Schlachter, F., Barnett, J., Thesen, M. W., Gadegaard, N. , Grutzner, G. and Schleunitz, A. (2017) New organic photo-curable nanoimprint resist ≪mr-NIL210≫ for high volume fabrication applying soft PDMS-based stamps. Journal of Photopolymer Science and Technology, 30(5), pp. 605-611. (doi:10.2494/photopolymer.30.605)

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Abstract

Herein, we report on a newly developed and commercialized organic photo-curable Nanoimprint Lithography (NIL) resist, namely mr-NIL210. Since this new NIL resist follows an innovative design concept and contains solely specific monomers with a characteristic chemistry and molecular design, an extended longevity of applied polydimethyl siloxane (PDMS) stamps is enabled addressing a crucial key metric for industrial high-volume manufacturing processes. Moreover, the mr-NIL210 is characterized by a negligible oxygen sensitivity of the curing chemistry, outstanding film forming and adhesion performances as well as excellent plasma-based dry etch characteristics for various substrate materials like silicon, aluminum, sapphire, titanium, etc.

Item Type:Articles
Keywords:Nanoimprint lithography, PDMS-based stamps, high volume nanofabrication, PDMS compatibility.
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Greer, Mr Andrew and Gadegaard, Professor Nikolaj
Authors: Messerschmidt, M., Greer, A., Schlachter, F., Barnett, J., Thesen, M. W., Gadegaard, N., Grutzner, G., and Schleunitz, A.
College/School:College of Science and Engineering > School of Engineering > Biomedical Engineering
Journal Name:Journal of Photopolymer Science and Technology
Publisher:Technical Association of Photopolymers, Japan
ISSN:1349-6336
Copyright Holders:Copyright © 2017 The Authors
Publisher Policy:Reproduced in accordance with the copyright policy of the publisher.

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