High resolution e-beam lithography using a thin titanium layer to promote resist adhesion

Macintyre, D.S., Young, I., Glidle, A., Cao, X., Weaver, J.M.R. and Thoms, S. (2006) High resolution e-beam lithography using a thin titanium layer to promote resist adhesion. Microelectronic Engineering, 83(4-9), pp. 1128-1131. (doi:10.1016/j.mee.2006.01.103)

Full text not currently available from Enlighten.

Publisher's URL: http://dx.doi.org/10.1016/j.mee.2006.01.103


Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Thoms, Dr Stephen and Macintyre, Dr Douglas and Weaver, Professor Jonathan and Glidle, Dr Andrew
Authors: Macintyre, D.S., Young, I., Glidle, A., Cao, X., Weaver, J.M.R., and Thoms, S.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
College of Science and Engineering > School of Engineering > Biomedical Engineering
Journal Name:Microelectronic Engineering
ISSN:0167-9317

University Staff: Request a correction | Enlighten Editors: Update this record