Macintyre, D.S., Young, I., Glidle, A., Cao, X., Weaver, J.M.R., and Thoms, S. (2006) High resolution e-beam lithography using a thin titanium layer to promote resist adhesion. Microelectronic Engineering, 83 (4-9). pp. 1128-1131. ISSN 0167-9317 (doi:10.1016/j.mee.2006.01.103)
Full text not currently available from Enlighten.
Publisher's URL: http://dx.doi.org/10.1016/j.mee.2006.01.103
| Item Type: | Article |
|---|---|
| Status: | Published |
| Refereed: | Yes |
| Glasgow Author(s): | Macintyre, Dr Douglas and Weaver, Prof Jonathan and Thoms, Dr Stephen and Glidle, Dr Andrew |
| Authors: | Macintyre, D.S., Young, I., Glidle, A., Cao, X., Weaver, J.M.R., and Thoms, S. |
| College/School: | College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering College of Science and Engineering > School of Engineering > Biomedical Engineering |
| Journal Name: | Microelectronic Engineering |
| ISSN: | 0167-9317 |
University Staff: Request a correction | Enlighten Editors: Update this record

![[feed]](http://eprints.gla.ac.uk/style/images/twitter-logo.png)
Tools
Tools