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High resolution e-beam lithography using a thin titanium layer to promote resist adhesion

Macintyre, D.S., Young, I., Glidle, A., Cao, X., Weaver, J.M.R., and Thoms, S. (2006) High resolution e-beam lithography using a thin titanium layer to promote resist adhesion. Microelectronic Engineering, 83 (4-9). pp. 1128-1131. ISSN 0167-9317 (doi:10.1016/j.mee.2006.01.103)

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Publisher's URL: http://dx.doi.org/10.1016/j.mee.2006.01.103


Item Type:Article
Status:Published
Refereed:Yes
Glasgow Author(s):Macintyre, Dr Douglas and Weaver, Prof Jonathan and Thoms, Dr Stephen and Glidle, Dr Andrew
Authors: Macintyre, D.S., Young, I., Glidle, A., Cao, X., Weaver, J.M.R., and Thoms, S.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
College of Science and Engineering > School of Engineering > Biomedical Engineering
Journal Name:Microelectronic Engineering
ISSN:0167-9317

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