A study of resist flow during nanoimprint lithography

Macintyre, D. and Thoms, S. (2005) A study of resist flow during nanoimprint lithography. Microelectronic Engineering, 78-79, pp. 670-675. (doi: 10.1016/j.mee.2004.12.083)

Full text not currently available from Enlighten.

Item Type:Articles
Glasgow Author(s) Enlighten ID:Thoms, Dr Stephen and Macintyre, Dr Douglas
Authors: Macintyre, D., and Thoms, S.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Microelectronic Engineering

University Staff: Request a correction | Enlighten Editors: Update this record