Macintyre, D. and Thoms, S. (2005) A study of resist flow during nanoimprint lithography. Microelectronic Engineering, 78-79, pp. 670-675. (doi: 10.1016/j.mee.2004.12.083)
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| Item Type: | Articles |
|---|---|
| Status: | Published |
| Refereed: | Yes |
| Glasgow Author(s) Enlighten ID: | Thoms, Dr Stephen and Macintyre, Dr Douglas |
| Authors: | Macintyre, D., and Thoms, S. |
| College/School: | College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering |
| Journal Name: | Microelectronic Engineering |
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