Monte Carlo simulations of delta-doping placement in sub-100 nm implant free InGaAs MOSFETs

Kalna, K., Wang, Q., Passlack, M. and Asenov, A. (2006) Monte Carlo simulations of delta-doping placement in sub-100 nm implant free InGaAs MOSFETs. Materials Science and Engineering B: Solid-State Materials for Advanced Technology, 135, pp. 285-288. (doi: 10.1016/j.mseb.2006.08.019)

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Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Asenov, Professor Asen and Kalna, Dr Karol
Authors: Kalna, K., Wang, Q., Passlack, M., and Asenov, A.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Materials Science and Engineering B: Solid-State Materials for Advanced Technology

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