The electron-phonon relaxation time in thin superconducting titanium nitride films

Kardakova, A., Finkel, M., Morozov, D. , Kovalyuk, V., An, P., Dunscombe, C., Tarkhov, M., Mauskopf, P., Klapwijk, T. M. and Goltsman, G. (2013) The electron-phonon relaxation time in thin superconducting titanium nitride films. Applied Physics Letters, 103(25), 252602. (doi:10.1063/1.4851235)

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Abstract

We report on the direct measurement of the electron-phonon relaxation time, τeph, in disordered TiN films. Measured values of τeph are from 5.5 ns to 88 ns in the 4.2 to 1.7 K temperature range and consistent with a T−3 temperature dependence. The electronic density of states at the Fermi level N0 is estimated from measured material parameters. The presented results confirm that thin TiN films are promising candidate-materials for ultrasensitive superconducting detectors.

Item Type:Articles
Keywords:TiN, electron-phonon, superconducting, kinetic inductance, HEB, hot electrons, KID.
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Morozov, Dr Dmitry
Authors: Kardakova, A., Finkel, M., Morozov, D., Kovalyuk, V., An, P., Dunscombe, C., Tarkhov, M., Mauskopf, P., Klapwijk, T. M., and Goltsman, G.
Subjects:Q Science > QC Physics
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Applied Physics Letters
Journal Abbr.:APL
Publisher:AIP Publishing
ISSN:0003-6951
ISSN (Online):1077-3118
Published Online:18 December 2013
Copyright Holders:Copyright © 2013 AIP Publishing LLC
First Published:First published in Applied Physics Letters 103(25): 252602
Publisher Policy:Reproduced in accordance with the publisher copyright policy

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