Chemical modification and micropatterning of Si(1 0 0) with oligonucleotides

Yin, H.B. , Brown, T., Greef, R., Wilkinson, J.S. and Melvin, T. (2004) Chemical modification and micropatterning of Si(1 0 0) with oligonucleotides. Microelectronic Engineering, 73-74, pp. 830-836. (doi:10.1016/j.mee.2004.03.060)

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A method for the reliable attachment of oligonucleotides to silicon (1 0 0) surfaces in patterns is described. UV light exposure of silicon (1 0 0) coated with alkenes functionalized with carboxylic acid groups and derivatives results in covalent attachment to the silicon surface. The carboxyl-terminated (and derivatives) surfaces act as a substrate for the chemistry of the subsequent attachment of oligonucleotides. Illustrated are our results gained for optimisation of the surface attachment chemistry and the characterisation of the surface with scanning electron microscopy, epifluorescence microscopy and ellipsometry.

Item Type:Articles
Glasgow Author(s) Enlighten ID:Yin, Professor Huabing
Authors: Yin, H.B., Brown, T., Greef, R., Wilkinson, J.S., and Melvin, T.
College/School:College of Science and Engineering > School of Engineering > Biomedical Engineering
Journal Name:Microelectronic Engineering
ISSN (Online):1873-5568
Published Online:09 April 2004

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