Li, X. (1995) A Study of Low Temperature and Low Pressure CVD of Tantalum Oxide Thin Films. In: 10th European Conference on Chemical Vapour Deposition, Venice, Italy, 10-15 Sept 1995,
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Abstract
No abstract available.
| Item Type: | Conference Proceedings |
|---|---|
| Status: | Published |
| Refereed: | Yes |
| Glasgow Author(s) Enlighten ID: | Li, Dr Xu |
| Authors: | Li, X. |
| College/School: | College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering |
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