Li, X. , Gay, D.L., McNeill, D.W., Armstrong, B.M. and Gamble, H.S. (1998) BESOI Using a Silicon Germanium Etch Stop. In: Fourth International Symposium on Semiconductor Wafer Bonding : Science, Technology, and Applications, Paris, France, 1997, pp. 313-320. ISBN 9781566771894
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Abstract
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| Item Type: | Conference Proceedings |
|---|---|
| Status: | Published |
| Refereed: | Yes |
| Glasgow Author(s) Enlighten ID: | Li, Dr Xu |
| Authors: | Li, X., Gay, D.L., McNeill, D.W., Armstrong, B.M., and Gamble, H.S. |
| College/School: | College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering |
| ISBN: | 9781566771894 |
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