Hill, R.J.W., Li, X. , Moran, D.A.J. , Zhou, H. and Thayne, I.G. (2006) A Low Damage Subtractive Ohmic Contact Process for III-V Mosfets. In: UK III-V Compound Semiconductors 2006, Sheffield, UK,
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Abstract
No abstract available.
Item Type: | Conference Proceedings |
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Status: | Published |
Refereed: | Yes |
Glasgow Author(s) Enlighten ID: | Zhou, Dr Haiping and Thayne, Prof Iain and Hill, Mr Richard and Moran, Professor David and Li, Dr Xu |
Authors: | Hill, R.J.W., Li, X., Moran, D.A.J., Zhou, H., and Thayne, I.G. |
College/School: | College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering |
Publisher: | IOP/EPSRC |
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