Comparison of single-layer and double-layer anti-reflection coatings using laser-induced damage threshold and photothermal common-path interferometry

Clark, C., Bassiri, R., Martin, I. W. , Markosyan, A., Murray, P. G. , Gibson, D., Rowan, S. and Fejer, M. (2016) Comparison of single-layer and double-layer anti-reflection coatings using laser-induced damage threshold and photothermal common-path interferometry. Coatings, 6(2), 20. (doi: 10.3390/coatings6020020)

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Abstract

The dielectric thin-film coating on high-power optical components is often the weakest region and will fail at elevated optical fluences. A comparison of single-layer coatings of ZrO2, LiF, Ta2O5, SiN, and SiO2 along with anti-reflection (AR) coatings optimized at 1064 nm comprised of ZrO2 and Ta2O5 was made, and the results of photothermal common-path interferometry (PCI) and a laser-induced damage threshold (LIDT) are presented here. The coatings were grown by radio frequency (RF) sputtering, pulsed direct-current (DC) sputtering, ion-assisted electron beam evaporation (IAD), and thermal evaporation. Test regimes for LIDT used pulse durations of 9.6 ns at 100 Hz for 1000-on-1 and 1-on-1 regimes at 1064 nm for single-layer and AR coatings, and 20 ns at 20 Hz for a 200-on-1 regime to compare the //ZrO2/SiO2 AR coating.

Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Rowan, Professor Sheila and Bassiri, Mr Riccardo and Martin, Dr Iain and Murray, Dr Peter
Authors: Clark, C., Bassiri, R., Martin, I. W., Markosyan, A., Murray, P. G., Gibson, D., Rowan, S., and Fejer, M.
College/School:College of Science and Engineering > School of Physics and Astronomy
Research Centre:College of Science and Engineering > School of Physics and Astronomy > Institute for Gravitational Research
Journal Name:Coatings
Publisher:MDPI
ISSN:2079-6412
ISSN (Online):2079-6412
Published Online:10 May 2016
Copyright Holders:Copyright © 2016 The Authors
First Published:First published in Coatings 6(2): 20
Publisher Policy:Reproduced under a Creative Commons License

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