Undoped InOx films deposited by radio frequency plasma enhanced reactive thermal evaporation at room temperature: importance of substrate

Parreira, P. , Lavareda, G., Valente, J. , Nunes, F.T., Amaral, A. and Nunes de Carvalho, C. (2010) Undoped InOx films deposited by radio frequency plasma enhanced reactive thermal evaporation at room temperature: importance of substrate. Journal of Nanoscience and Nanotechnology, 10(4), pp. 2701-2704. (doi:10.1166/jnn.2010.1431) (PMID:20355487)

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Abstract

Conductive and transparent undoped thin films of indium oxide (InOx ), 120 nm average thick, were deposited by radio frequency plasma enhanced reactive thermal evaporation (rf-PERTE) of indium in the presence of oxygen at room temperature. Several substrates were used in order to study their influence on the main properties of these films: alkali free (AF) glass, fused silica, crystalline silicon and polyethylene terephthalate (PET). Surface morphology of the InOx films as a function of the substrates was observed by SEM and showed that the undoped InOx films obtained are nanostructured. For the c-Si substrate, InOx films with increased grain size are obtained, induced by the crystalline substrate. Films deposited on fused silica and AF glass substrates show a nano-grainy surface with similar surface morphologies. The InOx films deposited on AF glass show the highest values of both: electrical conductivity of about 1100 ( cm)−1 and visible transmittance of 85%. The substrate has a greater influence on the surface morphology of the films when a polymer (PET) is used. InOx films deposited on PET show a decrease in the electrical conductivity (90 ( cm)−1) and a slight decrease in the average visible transmittance (78%).

Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Valente, Dr Joao and Parreira, Dr Pedro Miguel
Authors: Parreira, P., Lavareda, G., Valente, J., Nunes, F.T., Amaral, A., and Nunes de Carvalho, C.
College/School:College of Science and Engineering > School of Physics and Astronomy
College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Journal of Nanoscience and Nanotechnology
Publisher:American Scientific Publishers
ISSN:1533-4880
ISSN (Online):1533-4899

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