Four-point characterization using capacitive and ohmic contacts

Zhou, W., Kim, B., Shah, Y. , Zhou, C., Grayson, M. and Nebile, I. (2012) Four-point characterization using capacitive and ohmic contacts. In: APS March Meeting, 27 Feb-2 March 2012,

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Abstract

A four-point characterization method is developed for semiconductor samples that have either capacitive or ohmic contacts. When capacitive contacts are used, capacitive current- and voltage-dividers result in a capacitive scaling factor which is not present in four-point measurements with only ohmic contacts. Both lock-in amplifier and pre-amplifier are used to measure low-noise response over a wide frequency range from 1 Hz -- 100 kHz. From a circuit equivalent of the complete measurement system after carefully being modeled, both the measurement frequency band and capacitive scaling factor can be determined for various four-point characterization configurations. This technique is first demonstrated with a discrete element four-point test device and then with a capacitively and ohmically contacted Hall bar sample using lock-in measurement techniques. In all cases, data fit well to a circuit simulation of the entire measurement system over the whole frequency range of interest, and best results are achieved with large area capacitive contacts and a high input-impedance preamplifier stage. Results of samples (substrates grown by Max Bichler Dieter Schuh, and Frank Fischer of the WSI) measured in the QHE regime in magnetic fields up to 15 T at temperatures down to 1.5 K will also be shown.

Item Type:Conference Proceedings
Additional Information:APS meeting abstracts.
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Shah, Mr Yash Diptesh
Authors: Zhou, W., Kim, B., Shah, Y., Zhou, C., Grayson, M., and Nebile, I.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
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