Topography-free sample for thermal spatial response measurement of scanning thermal microscopy

Ge, Y., Zhang, Y., Weaver, J. M.R., Zhou, H. and Dobson, P. S. (2015) Topography-free sample for thermal spatial response measurement of scanning thermal microscopy. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 33, 06FA03. (doi:10.1116/1.4933172)

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Abstract

A novel fabrication technique is described for the production of multimaterial, lithographically defined, topography-free samples for use in experiments to investigate the nature of contrast in scanning probe microscopy (SPM). The approach uses a flat sacrificial substrate as the base for fabrication, which is deleted in the final step. This leaves an exposed, flat surface with patterns of materials contrast defined during the lithography stages. In the example application presented, these are designed to challenge the detection ability of a scanning thermal microscopy (SThM) probe, although many other applications can be envisioned. There are many instances in SPM where images can exhibit topographically induced artifacts. In SThM, these can result in a change of the thermal signal which can easily be misinterpreted as changes in the sample thermal conductivity or temperature. The elimination of these artifacts through postprocessing requires a knowledge of how the probe responds thermal features of differing sizes. The complete sample fabrication process, followed by successful topographic/thermal scanning is demonstrated, showing sub-1.5 nm topography with a clear artifact-free thermal signal from sub-100 nm gold wires. The thermal spatial resolution is determined for the sample materials and probe used in this study to be in the range of 35–75 nm.

Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Zhou, Dr Haiping and Dobson, Dr Phil and Weaver, Professor Jonathan and Zhang, Dr Yuan
Authors: Ge, Y., Zhang, Y., Weaver, J. M.R., Zhou, H., and Dobson, P. S.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Publisher:American Institute of Physics ; American Vacuum Society
ISSN:1071-1023
ISSN (Online):1520-8567
Copyright Holders:Copyright © 2015 American Vacuum Society
First Published:First published in Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 33:06FA03
Publisher Policy:Reproduced in accordance with the copyright policy of the publisher

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Project CodeAward NoProject NamePrincipal InvestigatorFunder's NameFunder RefLead Dept
622881QUANTIHEATPhil DobsonEuropean Commission (EC)604668ENG - ENGINEERING ELECTRONICS & NANO ENG