Modelling RTN and BTI in nanoscale MOSFETs from device to circuit: a review

Gerrer, L., Ding, J., Amoroso, S.M., Adamu-Lema, F., Hussin, R., Reid, D., Millar, C. and Asenov, A. (2014) Modelling RTN and BTI in nanoscale MOSFETs from device to circuit: a review. Microelectronics Reliability, 54(4), pp. 682-697. (doi: 10.1016/j.microrel.2014.01.024)

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Abstract

In this paper we summarize the impact of Statistical Variability (SV) on device performances and study the impact of oxide trapped charges in combination with SV. Traps time constants are described and analysed in combination with SV and time dependent simulations are performed including SV, random traps and charge injection stochasticity. Finally we demonstrate the necessity of statistical simulations in extracting compact models of aged devices and we address the problem of aged SRAM cell reliability.

Item Type:Articles
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Gerrer, Dr Louis and Amoroso, Dr Salvatore and Asenov, Professor Asen and Adamu-Lema, Dr Fikru
Authors: Gerrer, L., Ding, J., Amoroso, S.M., Adamu-Lema, F., Hussin, R., Reid, D., Millar, C., and Asenov, A.
College/School:College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
Journal Name:Microelectronics Reliability
Publisher:Elsevier Ltd.
ISSN:0026-2714
ISSN (Online):1872-941X

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