High frequency hydrogen-terminated diamond field effect transistor technology

Moran, D. A. J. , Russell, S. A. O., Sharabi, S. and Tallaire, A. (2012) High frequency hydrogen-terminated diamond field effect transistor technology. In: 12th IEEE International Conference on Nanotechnology (IEEE-NANO), Birmingham UK, 20-23 Aug 2012, pp. 1-5. ISBN 9781467321983 (doi: 10.1109/NANO.2012.6321925)

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Abstract

We report on the fabrication and characterization of 120 nm and 50nm gate length hydrogen-terminated diamond field effect transistors. DC operation and performance Reduction of gate length from 120 nm to 50 nm is found to increase the extrinsic cut-off frequency (fT) from 43 GHz to 53 GHz. We believe this to be the highest cut-off frequency yet reported for a diamond based transistor.

Item Type:Conference Proceedings
Status:Published
Refereed:Yes
Glasgow Author(s) Enlighten ID:Sharabi, Mr Salah and Russell, Dr Stephen and Moran, Professor David
Authors: Moran, D. A. J., Russell, S. A. O., Sharabi, S., and Tallaire, A.
College/School:College of Science and Engineering > School of Chemistry
College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering
ISSN:1944-9399
ISBN:9781467321983

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Project CodeAward NoProject NamePrincipal InvestigatorFunder's NameFunder RefLead Dept
450861Ultra short gate length diamond FETs for high power/high frequency applicationsDavid MoranEngineering & Physical Sciences Research Council (EPSRC)EP/E054668/1ENG - ENGINEERING ELECTRONICS & NANO ENG