Patterning colloidal nanotopographies

Wood, M.A., Riehle, M. and Wilkinson, C.D.W. (2002) Patterning colloidal nanotopographies. Nanotechnology, 13, pp. 605-609. (doi: 10.1088/0957-4484/13/5/312)

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Creating a device where cell reactions to nanoscale topographies and a control (usually planar) surface can be monitored simultaneously is advantageous from a biological perspective. Through the utilization of both natural lithography and conventional photolithography techniques, it has been possible to create a structure where planar and nanopillared surfaces lie collaterally on one device. By patterning an optical resist, exposing this to the desired mask pattern, developing and coating in poly-L-lysine, a surface adhesive to gold colloidal particles is presented. Following immersion in a colloidal sol, in this case a 20 nm diameter gold colloidal sol, colloids adhere to the poly-L-lysine across the primed surface. In a subsequent dry etch step, the colloids that are present where the resist has been removed act as an etch mask, resulting in pillars being etched into the surface of a base substrate, in this instance either silicon or quartz. By removing the resist and also the colloids, a device results where planar and nanopillared areas lie collaterally. This allows cell reactions on the two surfaces to be monitored simultaneously.

Item Type:Articles
Glasgow Author(s) Enlighten ID:Riehle, Dr Mathis
Authors: Wood, M.A., Riehle, M., and Wilkinson, C.D.W.
College/School:College of Medical Veterinary and Life Sciences > Institute of Molecular Cell and Systems Biology
Journal Name:Nanotechnology
Publisher:IOP Publishing
ISSN (Online):1361-6528

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