Peralagu, U. , Li, X. , Ignatova, O. , Steer, M., Povey, I., Hurley, P. and Thayne, I. (2014) Demonstration of III-V fins with vertical sidewalls using Cl2/CH4/H2/O2 dry etch chemistry in conjunction with digital etching for recovery of etch damage. In: 45th IEEE Semiconductor Interface Specialists Conference (SISC), San Diego, CA, USA, 10 - 13 Dec 2014,
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Publisher's URL: http://www.ieeesisc.org/
Abstract
No abstract available.
Item Type: | Conference Proceedings |
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Status: | Published |
Refereed: | Yes |
Glasgow Author(s) Enlighten ID: | Thayne, Prof Iain and Peralagu, Mr Uthayasankaran and Steer, Dr Matthew and Li, Dr Xu and Ignatova, Dr Olesya |
Authors: | Peralagu, U., Li, X., Ignatova, O., Steer, M., Povey, I., Hurley, P., and Thayne, I. |
Subjects: | T Technology > TK Electrical engineering. Electronics Nuclear engineering |
College/School: | College of Science and Engineering > School of Engineering > Electronics and Nanoscale Engineering |
Research Group: | Ultrafast |
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